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Laser drawing equipment Product List

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Laser drawing device

Laser drawing device

Industry high-level high-resolution or high-throughput maskless laser direct writing equipment

Raith is known as a company that provides advanced technology in the field of nanofabrication, developing and designing cutting-edge tools including FIB-SEM and maskless EB direct writing systems. The company has a product lineup particularly suitable for fine pattern formation and nanoscale structure creation, which is utilized by a wide range of research institutions and industries. In 2021, it further expanded its product portfolio by acquiring 4PICO litho, a company that developed and manufactured maskless laser direct writing systems. Raith's tools support not only patterning on various substrates but also 3D structuring, boasting over 1,200 units delivered worldwide.

  • Electron beam lithography equipment
  • Other surface treatment equipment
  • Laser drawing equipment

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Laser drawing device "DWL 2000 GS" series

Laser drawing device "DWL 2000 GS" series

High-speed high-resolution laser exposure device

The "DWL 2000 GS" is a flexible, high-speed, high-resolution laser drawing device suitable for grayscale lithography. Grayscale lithography is a technique that reproduces slope patterns, such as microlenses and blazed diffraction gratings, on a resist, differing from traditional binary lithography. The "DWL 2000 GS" series has a maximum drawing area of 200x200 mm² or 400x400 mm², enabling high-speed, high-precision patterning on masks and wafers for applications requiring MEMS, BioMEMS, Micro-Optics, ASIC, Micro Fluidics, sensors, holograms, and other fine structures. To enhance surface roughness accuracy in grayscale lithography applications, it supports 1000 levels of grayscale. 【Features】 ■ High stability and high-speed, high-resolution exposure ■ Up to five selectable drawing modes ■ High-precision alignment camera system ■ Grayscale drawing mode *For more details, please refer to the catalog or feel free to contact us.

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Stepper
  • Laser drawing equipment

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VPG 300 DI

VPG 300 DI

A high-speed drawing device compatible with 300x300mm square substrates has been added to the VPG series.

- High precision and high-speed rendering - Maximum drawing area 300x300mm²

  • Other semiconductor manufacturing equipment
  • Laser drawing equipment

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